ASML's High-NA EUV Lithography: A 2024 Update

I plan to be in Antwerp, Belgium for IMEC's ITF World 2024 in May 21st and 22nd. It's my first trip to Belgium. If you are in town, please let me know. Would love to speak to you. Shoot me an email!

Imagine that your products is so good that the other competitor is... another product still made by you. One of the most important company in the world

For pronouncing Zeiss correctly

Of CAUSE we want to hear about DSA!

I'm always excited for an asianometry upload. You're so informative and funny af. I'll be a lifelong subscriber.

6:23 Obviously, that would be the TWIN²SCAN.

Woah, caught this one posted 15 seconds after upload. John, watching this now, and four minutes in, great content, as always.

i love how your sense of humor is so deadpan that it is barely discernable, yet beneath the surface lies some of the most maniacal hatred i have ever heard

Another thing Lithography is used for. is to create the microscopic UV mirrors in seren models of resin 3D printers. I wonder how long until they are so precise we'll literally won't be able to tell the layer lines.

I'm honestly amazed that this much information is in the public domain. Another fantastic video.

2x2 = Quadscan or Quac 🦆 for short

60 kilodrops of Sn/second? That's so insane! Must be pretty small drops.....

Re: Synchrotrons. Synchrotrons are Bremsstrahlung sources, they have very poor spectral brightness ("brilliance"). Total brightness in the rough spectral area doesn't really matter that much as the process relies heavily on having a near monochromatic beam. In terms of well established light sources you wouldn't want a synchrotron or wiggler, but rather an undulator. I work in developing a new medical imaging technique that also has issues with spectral brightness in the x-ray regime, and so far undulators are the best we can run (but we also run higher energies, so can't use optics to focus as well). I suspect that undulators are a combination of too big, too expensive and too dim for ASML, you basically need a particle accelerator to drive them and only get intensity proportional to sqrt(N) where N is the electron number. For context: the beamline my group uses most often uses a 53keV undulator attached to PETRA III. It produces ~1W/cm2 in (very nice) xray photons. There is an emerging technology that might work though - xray lasers. More specifically free electron lasers (FEL). European XFEL achieves 10**18 W/cm2 of even nicer photons. Buuuuut the beamsize is pretty small. In the FEL literature there are quite a few people talking about trying to make it usable for lithography though. So I'd keep an eye on that. Maybe when/if we move to 10keV and beyond and optics get more and more difficult it'll be back to lasers

Your guess about MOR is correct, Sn has a strong absorption for EUV because EUV is basically it is generated by Sn plasma.

Excuse me for a few moments while I pick the bits of my brain off the floor, walls, ceiling, and furniture. Getting these glimpses into the technology of chip making and other areas you cover fascinates me to no end. At least with the SQL videos, I understand what you're talking about, since I have some knowledge of the subject.

The Zeiss optics video trauma still seems to run deep. ^^

Wtf is this channel. This is amazing. You are so legitimate and intelligent.

So happy that this community has grown to almost 700,000 individuals. 1M soon! Keep up the fantastic content

Great stuff as usual. Also cool to hear you as a guest on other podcasts. Have a safe and productive trip!

Wow. I caught one early. Have an absolute blast in Antwerp. Hope you meet interesting people to tell their stories or just you know have fun in Belgium.